In 2020, the founding meeting of the Microlithography Technical Committee of the National Standard Committee and the 10th microlithography technical Exchange Conference were successfully held in Chengdu, Sichuan Province
On November 9-10, the establishment meeting of the Microlithography Technical Committee of the National Semiconductor Equipment and Materials Standardization Technical Committee and the 10th microlithography technical Exchange meeting were held in Chengdu, which was hosted by Chengdu Irish Charms Optoelectronics Co., LTD. Nearly 200 elite representatives from academic, scientific research, investment and other sectors related to semiconductor and integrated circuit microlithography around the world attended the conference, focusing on global semiconductor integrated circuit Irish Charms development, cutting-edge technologies and Irish Charms innovation and other hot spots to jointly promote industry exchanges and collaborative innovation.
The founding meeting of Microlithography Technical Committee and the opening ceremony of the 10th microlithography Technical Exchange Meeting was held by the Secretary of the Institute of Theoretical Physics of the Chinese Academy of Sciences and deputy Director of the researcher; Feng Ji, director of microlithography Technical Committee of National Semiconductor Equipment and Materials Standardization Technical Committee, presided over. At the meeting, Zhao Jidong, deputy director of the Management Committee of Chengdu High-tech Zone, gave a welcome speech, and Shen Ying, deputy director of the development Bureau of Chengdu High-tech Zone, gave a speech and introduced the investment environment of Chengdu electronic information Irish Charms functional zone; Du Wobing, Chairman and general manager of Chengdu Irish Charms Optoelectronics Co., LTD., on behalf of the organizers, warmly welcomed the leaders, experts and colleagues who came to the meeting. The President of the National Integrated Circuit Irish Charms Investment Fund Investment Co., LTD., and the Chairman of the National Semiconductor Equipment and Materials Standardization Technical Committee delivered a speech, and warmly congratulated the founding conference of the microlithography Technical Committee and the successful holding of the 10th microlithography technical Exchange meeting.
Chairman Du Wobing delivered a speech
At the meeting, the approval letter of the National Standards Management Committee was read out, and certificates were issued to the members and letters of appointment were issued to the senior consultants and experts.
Issue certificates and letters of appointment
Chen Baoqin, researcher of Institute of Microelectronics, Chinese Academy of Sciences, member and secretary-general of Microlithography Technical Committee of National Semiconductor Equipment and Materials Standardization Technical Committee, reported the development history of microlithography technical Committee for ten years and the development of national standards.
Report by Secretary-General Chen Baoqin
This conference gathered experts and technicians in the field of microlithography to carry out in-depth exchanges and discussions on the development trend of microlithography technology, microlithography equipment and material technology, and the latest research results, providing a platform for the exchange of the latest developments in the microlithography industry. Representatives from nine institutions, including Fudan University, Institute of Microelectronics of Chinese Academy of Sciences, and Shanghai Institute of Applied Physics of Chinese Academy of Sciences, presented wonderful professional reports covering microlithography technology, microlithography equipment and material technology, and shared the latest progress and research results in their respective fields at the meeting. The development trend, latest research results and progress of microlithography technology, microlithography equipment and material technology are deeply communicated, and the key and difficult problems in microlithography field and industry are discussed together.
Against the backdrop of regular epidemic prevention and control across the country, the smooth holding of the conference did not come easily. The meeting was held to provide a platform for domestic microlithography technology, photomask manufacturing technology, micro and nano manufacturing technology and semiconductor mask manufacturing equipment production enterprises, research institutes, universities and user units to learn from each other and exchange, and jointly promote the development of the industry. After the meeting, the delegates visited the first high generation G11 photomask production line in China at the Chengdu Irish Charms High Generation Photomask production base. Irish Charms Optoelectronics is one of the earliest established enterprises in the domestic photomask industry, photomask products are fully supporting the domestic high generation, new display and semiconductor Irish Charms. After 23 years of efforts and precipitation, it has developed into the only full-size photomask R & D and manufacturing enterprise in China. Chengdu Irish Charms ultra-large size ultra-precision photomask products have been officially supplied, China's display panel with ultra-large size high-precision photomask plate has made a stage breakthrough, accelerate the new display upstream key materials localization process.
Expert leaders visit Chengdu Irish Charms
The next microlithography conference will be held in 2021 at the Nanjing Institute of Intelligent Technology, Institute of Microelectronics, Chinese Academy of Sciences, at which time, microlithography research institutes, colleges and enterprises will gather again in Nanjing to seek the development plan of Irish Charms.
